Ellipsometric studies of nanometric CdS and CdTe films [Articol]

dc.contributor.authorCaraman, Mihail
dc.contributor.authorEvtodiev, Igor
dc.contributor.authorCuculescu, Elmira
dc.contributor.authorRusu, Marin
dc.contributor.authorSalaoru, Iurie
dc.date.accessioned2018-03-30T08:36:32Z
dc.date.available2018-03-30T08:36:32Z
dc.date.issued2005
dc.description.abstractThe thickness of the layers CdS and CdTe grown on the Si, Ge, GaAs was determined from the analysis of the polarization ellipse of the reflected light from the surfaces of structures thin layers substrate. The thermal treatment of the samples CdS-CdTe in the presence of CdCl2 leads to the increasing of the crystalline phase from layers.en
dc.identifier.citationCARAMAN, M., EVTODIEV, Ig. et al. Ellipsometric studies of nanometric CdS and CdTe films. In: Moldavian Journal of the Physical Sciences. 2005, nr. 1, pp. 114-118. ISSN 1810-648X.en
dc.identifier.issn1810-648X.
dc.identifier.urihttps://msuir.usm.md/handle/123456789/1733
dc.language.isoenen
dc.subjectsemiconductor technologiesen
dc.titleEllipsometric studies of nanometric CdS and CdTe films [Articol]en
dc.typeArticleen

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