2. Articole

Permanent URI for this collectionhttps://msuir.usm.md/handle/123456789/47

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Author: search.filters.author.Lungu, IonSubject: search.filters.subject.zinc oxide

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    STRUCTURAL AND OPTICAL PROPERTIES OF ZNO:GA THIN FILMS DEPOSITED ON ITO/GLASS SUBSTRATES FOR OPTOELECTRONIC APPLICATIONS
    (Academia de Ştiinţe a Moldovei, 2021) Rusnac, Dumitru; Lungu, Ion; Colibaba, Gleb; Potlog, Tamara
    Doped (with GaCl3), undoped ZnO and ITO/ZnO:Ga nanostructured thin films are synthesized using the spray pyrolysis method. The doped ZnO thin films are synthesized at the atomic ratio of Ga/Zn added in the starting solution fixed at 1, 2, 3, and 5. Gallium-doped ZnO films synthesized on glass/ITO substrates are annealed at 4500C in different environments: vacuum, oxygen, and hydrogen. X-ray diffraction (XRD), Energy-dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), and current–voltage (I–V) measurements are applied to characterize the structural properties, composition, surface morphology, and electrical properties of ZnO:Ga nanostructured thin films. X-ray diffraction analysis shows that ZnO:Ga films deposited on glass substrates have a dense and homogeneous surface with a hexagonal structure. The ZnO:Ga films deposited on glass/ITO substrates are composed of two phases, namely, hexagonal ZnO and cubic ITO. The I–V characteristics show the presence of good ohmic contacts between Al and In metals and ZnO:Ga thin films regardless of the nature of the substrate and the annealing atmosphere.
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    ZnO NANOMETRIC LAYERS USED IN PHOTOVOLTAIC CELLS
    (Springer Nature, 2020) Botnariuc, Vasile; Gorceac, Leonid; Coval, Andrei; Cinic, Boris; Gaugas, Petru; Chetrus, Petru; Lungu, Ion; Raevschi, Simion
    The ZnO thin layers were grown on glass, InP and pInP-nCdS substrates from zinc acetate dissolved in water-acetic acid-methanol solution having a molarity of 0.2 M by using the spray method in the argon flow in the temperature range of (250–450) °C. The dependence of optical properties of ZnO layers on growth temperature have been investigated. The optical transmittance has values of 80–85% in the wavelength range of (200–1000) nm. The using of ZnO of the thickness of (60–80) nm as antireflective layers in nCdS-pInP structures allowed to increase the photovoltaic cell efficiency by 3%. The photosensitivity of the fabricated nZnO-pInP structures covers the wavelength region from 450 nm up to 1100 nm and allows the more efficient utilization of the incident light.