2. Articole
Permanent URI for this collectionhttps://msuir.usm.md/handle/123456789/47
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Item SYNTHESIS AND PROPERTIES OF AL-DOPED ZnO THIN FILMS FOR PHOTOVOLTAICS(Institute of Electrical and Electronics Engineers Inc., 2018-11-27) Potlog, Tamara; Lungu, Ion; Botnariuc, Vasile; Gorceac, Leonid; Raevschi, Simion; Taku, Miyake; Worasawat, Suchada; Mimura, HidenoriPolycrystalline undoped and Al-doped ZnO thin films were deposited by spray pyrolysis using oxygen and argon atmospheres. The influence of postdeposition vacuum annealing on the structure, morphology and optical properties was studied by X-ray diffraction, atomic force microscopy and UV–VIS spectroscopy. The thermal vacuum annealing induces structural and morphological changes, especially in Al-doped ZnO thin films synthetized in oxygen atmosphere. Further on, the electrical conductivity in dependence of the nature of gas atmosphere and Al concentration is discussed.Item THE CARACTERIZATION OF THE CdS-BASED SOLAR CELL HETEROJUNCTIONS(Institute of Electrical and Electronics Engineers Inc., 2010-10-11) Potlog, Tamara; Botnariuc, Vasile; Gorceac, Leonid; Spalatu, Nicolae; Maticiuc, Natalia; Raevschi, SimionThe CdS-based solar cell heterojunctions (HJ) have been obtained by growth of CdS at relatively lower temperature using the close space sublimation method(CSS). Investigation of the photovoltaic characteristics shows an efficiency of about 12 % for InP/CdS and 9.6 % for CdS/CdTe solar cell HJ. The analysis of the forward dark current-voltage and the capacitance-voltage characteristics indicate a tunnelling recombination current which flows through states near or at the interfaces of a thermal energy of about 0.62 eV for CdS/CdTe and 0.42 eV for InP/CdS solar cell heterojunctions. The solar energy conversion efficiency is influenced by the interface states through the open circuit voltage and the fill factor.Item CdS NANOMETRIC LAYERS GROWN ON SnO2 COATED GLASS SUBSTRATES FOR PHOTOVOLTAIC DEVICES(2012) Botnariuc, Vasile; Gorceac, Leonid; Coval, Andrei; Chetruș, Petru; Cinic, Boris; Raevschii, Simion; Micli, ValdecCdS layer thickness decreases at high substrate temperatures due to the fact that a part of CdCl2/(NH2)2 CS aqueous solution evaporates without reaching the substrate surface. CdS layers deposited at the substrate temperature from 250oC to 450oC are growing with a deficit of sulfur. CdS layers with better stoichiometry were grown in the conditions when in the solutions, used for CdS layers growing, there is an excess of thiourea (CdCl2/ TU =1:2). The high charge carrier concentration of 1020cm-3 in CdS layers grown on glass substrates coated with SnO2 layer is related to Sn doping of the layers from SnO2 layer.Item THIN AlN FILMS GROWTH ON Si (III) BY HYDRIDE VAPOR PHASE EPITAXY(2008) Raevschi, Simion; Davydov, Valerii; Zhilaev, Yurii; Gorceac, Leonid; Botnariuc, VasileThin AlN layers have been grown on Si (111) by hydride vapor phase epitaxy (HVPE) method in a horizontal quartz reactor. The surface of layers has been studied by scanning electron microscopy and by the Raman spectroscopy method and found to have the structured morphology. It has been determined that the layers have high specific electrical resistance and are strained in the plane of the substrate.Item EFFECT OF CARRIER GAS AND VACUUM ANNEALING ON THE PHYSICAL PROPERTIES OF ZnO THIN FILMS DOPED WITH GALLIUM BY CHEMICAL SPRAY PYROLYSIS(Editura "Tehnica-UTM", 2018-05-24) Potlog, Tamara; Lungu, Ion; Botnariuc, Vasile; Raevschi, Simion; Worasawat, Suchada; Mimura, Hidenori; Gorceac, LeonidStructural, optical and electrical properties of zinc oxide thin films doped with 2% Ga, annealed in the vacuum at the same temperature and obtained onto glass substrates by the chemical spray pyrolysis method in the different gas atmospheres were investigated by X-ray Diffraction (XRD), UV-VIS spectrophotometry and Hall measurements, respectively. XRD studies revealed that all films were polycrystalline in nature, with a hexagonal wurtzite crystal structure and a predominant (002) c-axis orientation. All ZnO:Ga thin films had higher than 80 % transmittances in the visible region. Doping with 2% Ga led to a decrease in the optical band gap indifferent of the nature of the carrier gas. The synthesis of ZnO thin films with 2% Ga doping and annealing in the same conditions in Ar and O2 atmospheres led to the lower conductivity with electron concentration of 1016 cm−3.Item STANAT DE CADMIU OBŢINUT PRIN METODA PULVERIZĂRII(CEP USM, 2013-09-26) Botnariuc, Vasile; Gorceac, Leonid; Coval, Andrei; Inculeţ, Ion; Chetruş, Petru; Raevschi, SimionItem FOTODETECTOR PE HETEROJONCȚIUNE DIN FOSFURĂ DE INDIU(CEP USM, 2020) Gorceac, Leonid; Botnariuc, Vasile; Coval, Andrei; Vatavu, Sergiu; Cinic, Boris; Raevschi, Simion; Rotaru, CorneliuItem STRATURI NANOMETRICE SNO2 PENTRU STRUCTURI FOTOVOLTAICE(CEP USM, 2014) Botnariuc, Vasile; Gorceac, Leonid; Cinic, Boris; Inculeţ, Ion; Raevschi, SimionItem ZnO NANOMETRIC LAYERS USED IN PHOTOVOLTAIC CELLS(Springer Nature, 2020) Botnariuc, Vasile; Gorceac, Leonid; Coval, Andrei; Cinic, Boris; Gaugas, Petru; Chetrus, Petru; Lungu, Ion; Raevschi, SimionThe ZnO thin layers were grown on glass, InP and pInP-nCdS substrates from zinc acetate dissolved in water-acetic acid-methanol solution having a molarity of 0.2 M by using the spray method in the argon flow in the temperature range of (250–450) °C. The dependence of optical properties of ZnO layers on growth temperature have been investigated. The optical transmittance has values of 80–85% in the wavelength range of (200–1000) nm. The using of ZnO of the thickness of (60–80) nm as antireflective layers in nCdS-pInP structures allowed to increase the photovoltaic cell efficiency by 3%. The photosensitivity of the fabricated nZnO-pInP structures covers the wavelength region from 450 nm up to 1100 nm and allows the more efficient utilization of the incident light.Item ELECTRICAL PROPERTIES OF THERMAL ANNEALED IN VACUUM SPRAY DEPOSITED AL-DOPED ZnO THIN FILMS(Springer Nature, 2020) Potlog, Tamara; Lungu, Ion; Raevschi, Simion; Botnariuc, Vasile; Robu, Stephan; Worasawat, Suchada; Mimura, HidenoriAl-doped ZnO thin films have been prepared by spray pyrolysis, which facilitates the incorporation of a higher percentage of dopant atoms. The vacuum thermally annealed at 420 °C temperature thin films have been characterized by X-ray diffraction (XRD), optical spectroscopy. Electrical conductivity and the Hall effect are investigated in the temperature interval (77–300) K. X-ray analysis results reveal that all the films are polycrystalline with a hexagonal wurtzite structure with a preferential orientation according to the direction (002) plane. Different characters of the temperature dependence of conductibility are observed in the Al-doped ZnO films vacuum thermally annealed at 420 °C temperature. In all cases, the conductivity, mobility carriers and carriers’ concentration of ZnO thin films obtained under Ar are higher than under O2 atmosphere, unless they are not doped. of your paper no longer than 300 words.
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