Electrical and photoelectrical properties of heterojunctions on the base of Cu(InGa)Se2 [Articol]

Abstract

CdS films deposited by hot wall technique on mica were used as substrates for Cu(InGa)Se2 deposition. Two methods were used for the deposition of Cu(InGa)Se2 films: a) vacuum thermal evaporation from a single source and b) “flash” evaporation. The obtained films were of p-type conductivity with hole concentration varied from 2×1018 cm-3 to 6×1020 cm-3 depending on the fabrication method. The structures Cu(InGa)Se2–CdS were divided into two groups: the structures of type I having the CdS film thickness from 1.6 m to 2.8 m and the structures of type II having the CdS film thickness from 0.6 m to 0.8 m. It was established that the direct/reverse current ratio is 8-16. For the first type heterostructures the diffusion potential is 1.2–1.8 V and for the second type is 0.2–0.34 V. The Cu(InGa)Se2–CdS fotosensitivity is situated in the wavelength region from 0.51 m to 1.1 m and is determined by the electron-hole pair generation in both materials.