XPS study of Rh/In2O3 system [Articol]

dc.contributor.authorKorotcenkov, Ghenadii
dc.contributor.authorBrinzari, Vladimir
dc.contributor.authorNehasil, Vaclav
dc.date.accessioned2022-02-23T10:58:18Z
dc.date.available2022-02-23T10:58:18Z
dc.date.issued2021
dc.description.abstractThe effect of surface modification of In2O3 films by rhodium atoms deposited by electron beam sputtering on the XP spectra is considered. The surface coverage with rhodium ranged from 0 to 0.1 ML. It was shown that the main changes in the XP spectra occur in the Rh3d region and are caused by the dimensional effect of rhodium particles. With an increase in the surface coverage with rhodium, Rh particles grow from an atomically dispersed state to relatively large clusters. As the particle size increases, its electronic structure tends to approach the state corresponding to the bulk Rh. Such a process is accompanied by a decrease in BE Rh3d5/2 by 0.3–0.6 eV, which behaviour depends on the surface structure of the used In2O3 films.en
dc.identifier.citationKOROTCHENKOV, G., BRINZARI, V., NEHASIL, Vaclav. XPS study of Rh/In2O3 system. In: Surfaces and Interfaces. 2021, nr. 22, p. 0. ISSN 2468-0230.en
dc.identifier.issn2468-0230
dc.identifier.urihttps://doi.org/10.1016/j.surfin.2020.100794
dc.identifier.urihttps://msuir.usm.md/handle/123456789/5716
dc.language.isoenen
dc.publisherElsevieren
dc.subjectsurfaceen
dc.subjectcharacterisationen
dc.subjectatomic dispersionen
dc.subjectclusteringen
dc.subjectbinding energyen
dc.subjectelectron beam evaporationen
dc.titleXPS study of Rh/In2O3 system [Articol]en
dc.typeArticleen

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