OXYGEN-DEPENDENT FORMATION OF VO2 THIN FILMS BY METALORGANIC AEROSOL DEPOSITION
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Date
2018-05-24
Journal Title
Journal ISSN
Volume Title
Publisher
Universitatea Tehnică din Moldova
Abstract
We report on the growth and properties of
vanadium dioxide (VO2) on amorphous and oriented substrates
by the low-cost and industry-oriented method of metalorganic
aerosol deposition (MAD). X-ray diffraction and temperature-
dependent Raman spectroscopy confirm formation of single
phase tin films. Abrupt change of resistance by 5×103 times and
steep drop of infrared transmission from 49 to 10% at 1700 nm
pave the way for application of MAD technique in fabrication of
VO2-based optoelectronic and thermochromic devices, such as
“smart windows”.
Description
BELENCHUK, Alexandr; Oleg M. SHAPOVAL; E.ZASAVITSKY; Sergiu VATAVU; Arcady KIRITSA și V.MOSHNYAGA. Oxygen-dependent formation of vo2 thin films by metalorganic aerosol deposition. In: Telecommunications, Electronics and Informatics: 6th International Conference, Chisinau, May 24-27, 2018.Chisinau: UTM, 2018. pp.115-118.
Keywords
VO2 thin films, metalorganic aerosol deposition, surface morphology, crystal structure, Raman spectroscopy, resistance switching, optical transmittance
Citation
BELENCHUK, Alexandr; Oleg M. SHAPOVAL; E.ZASAVITSKY; Sergiu VATAVU; Arcady KIRITSA și V.MOSHNYAGA. Oxygen-dependent formation of vo2 thin films by metalorganic aerosol deposition. In: Telecommunications, Electronics and Informatics: 6th International Conference, Chisinau, May 24-27, 2018. Chisinau: UTM, 2018. pp.115-118.