The analysis of current flow mechanism in CdS/CdTe heterojunction [Articol]

dc.contributor.authorVatavu, Sergiu
dc.contributor.authorGașin, Petru
dc.date.accessioned2021-03-26T13:53:16Z
dc.date.available2021-03-26T13:53:16Z
dc.date.issued2007
dc.description.abstractAn analysis of current–voltage dependencies of CdS/CdTe heterojunction in the 78–370 K temperature range has been carried out. According to this analysis the current flow mechanism is determined by the tunneling processes through dislocations, which penetrate the heterojunction space charge region. The concentration of dislocations has been estimated as 2 · 105 cm− 2. The number of steps necessary for tunneling varies: 2.5 · 102–1.7 · 103. The characteristic energy has a weak temperature dependence (− 0.2 meV/K) and its value vary 120–200 meV. The increase of the annealing duration results in the decrease of the characteristic energy. The multistep tunneling processes through local centres, determined by impurity centres, interface states and defects in the space charge region, predominate at reverse biases. The number of tunneling steps is 1–4 · 102. The concentration of local centres (traps) in the heterojunction have been estimated as 2.37 · 105–1.63 · 106 cm− 3. The thermal annealing in the presence of CdCl2 up to 60 min does not modify the current flow mechanism in CdS/CdTe heterojunctions.en
dc.identifier.citationVATAVU, Sergiu, GAȘIN, Petru. The analysis of current flow mechanism in CdS/CdTe heterojunction. In: Thin Solid Films. 2007, Vol. 515, Issue 15 pp. 6179 - 6183. ISSN 0040 - 6090.en
dc.identifier.issn0040-6090
dc.identifier.urihttps://www.sciencedirect.com/science/article/abs/pii/S0040609006016403
dc.identifier.urihttps://msuir.usm.md/handle/123456789/4012
dc.language.isoenen
dc.publisherElsevieren
dc.subjectCdS/CdTeen
dc.subjectheterojunctionsen
dc.subjectсurrent flow mechanismen
dc.titleThe analysis of current flow mechanism in CdS/CdTe heterojunction [Articol]en
dc.typeArticleen

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