OBŢINEREA STRATURILOR AlN PE Si PRIN METODA HVPE ŞI CERCETAREA PROPRIETĂŢILORLOR

dc.contributor.authorRaevschi, Simion
dc.contributor.authorDavydov, Valerii
dc.contributor.authorZhilyaev, Yurii
dc.contributor.authorGorceac, Leonid
dc.contributor.authorBotnariuc, Vasile
dc.date.accessioned2021-03-04T11:27:52Z
dc.date.available2021-03-04T11:27:52Z
dc.date.issued2008
dc.description.abstractAlN layers on Si(111) were fabricated by Hydride Vapor Phase Eptaxy (HVPE). The obtained layers were studied by using Raman spectroscopy and by scanning electron microscope (SEM). The layers surface is structured. The Raman spectra of the layers, obtained at the temperatures of 800-1100oC, are presented. It was established that the layers are mechanically deformed in substrate plane and have a high value of the threshold voltage (are dielectrics).en
dc.identifier.citationRAEVSCHI, Simion, DAVÎDOV, Valerii, et. al. Obţinerea straturilor AIN pe Si prin metoda HVPE şi cercetarea proprietăţilor lor. In: Studia Universitatis Moldaviae Seria Ştiinţe Reale şi ale Naturii:Biologie. Chimie. Revista științifică. 2008, nr. 2(12). pp. 217-220. ISSN 1814-3237.en
dc.identifier.issn1814-3237
dc.identifier.urihttp://studiamsu.eu/nr-2-12-2008/
dc.identifier.urihttps://msuir.usm.md/handle/123456789/3906
dc.language.isoroen
dc.publisherCEP USMen
dc.subjectstraturi AlNen
dc.titleOBŢINEREA STRATURILOR AlN PE Si PRIN METODA HVPE ŞI CERCETAREA PROPRIETĂŢILORLORen
dc.typeArticleen

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