Facultatea de Fizică şi Inginerie / Faculty of Physics and Engineering

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End date: 2018Subject: search.filters.subject.halide vapor transport

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    Halide-carbon vapor transport of ZnO and its application perspectives for doping with multivalent metals [Articol]
    (Elsevier, 2018) Colibaba, Gleb
    The growth of ZnO single crystals in closed ampoules using HCl+C mixture as a chemical vapor transport agent (TA) was studied. The influence of growth temperature, TA density, C/HCl ratio, and undercooling on the ZnO mass transport rate was investigated theoretically and experimentally. The influence of growth medium composition on the features of crystal growth, such as the minimization of growth nucleus density, the increase in the lateral growth rate of up to 1 mm per day, the suppression of the attachment effect, and stable growth of non-polar, semi-polar and polar planes of a hexagonal structure was analyzed. The structural, photoluminescent, optical and electrical properties were investigated. The doping efficiency of ZnO by oxides of metals was analyzed for various TAs and Zn pressure in the growth medium. The possibility of increase in the doping efficiency by several orders of magnitude for multivalent metals was predicted for HCl+C TA.
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    Halide-oxide carbon vapor transport of ZnO: Novel approach for unseeded growth of single crystals with controllable growth direction [Articol]
    (Elsevier, 2018) Colibaba, Gleb
    The thermodynamic analysis of using HCl + CO gas mixture as a chemical vapor transport agent (TA) for ZnO single crystal growth in closed ampoules, including 11 chemical species, is carried out for wide temperature and loaded TA pressure ranges. The advantages of HCl + CO TA for faster and more stable growth are shown theoretically in comparison with HCl, HCl + H2 and CO. The influence of the growth temperature, of the TA density, of the HCl/CO ratio, and of the undercooling on the ZnO mass transport rate was investigated theoretically and experimentally. The HCl/CO ratios favorable for the growth of m planes and (0001)Zn surface were found. It was shown that HCl + CO TA provides: (i) a rather high growth rate (up to 1.5 mm per day); (ii) a decrease of wall adhesion effect and an etch pit density down to 103 cm−2; (iii) a minimization of growth nucleus quantity down to 1; (iv) stable unseeded growth of the high crystalline quality large single crystals with a controllable preferred growth direction. The characterization by the photoluminescence spectra, the transmission spectra and the electrical properties are analyzed.